Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yong-Tae Cho0
Suk-Ki Kim0
Date of Patent
August 18, 2009
0Patent Application Number
117686200
Date Filed
June 26, 2007
0Patent Primary Examiner
Patent abstract
A method for fabricating a semiconductor device includes forming a hard mask pattern over a substrate having a field oxide layer, etching the substrate to form a recess by using the hard mask pattern, forming a first conductive layer over the recess and the hard mask pattern, planarizing the first conductive layer, and forming a second conductive layer over the planarized first conductive layer.
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