Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
August 18, 2009
Patent Application Number
11296233
Date Filed
December 8, 2005
Patent Primary Examiner
Patent abstract
A lithography system and method for operating the same. The lithography system may include a cathode adapted to emit an electron beam, a beam-homogenizing structure, capable of increasing at least one of the uniformity and energetic of the electron beam, and a mask adapted to accelerate the electron beam to form a pattern on a wafer.
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