Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
September 22, 2009
Patent Application Number
11334939
Date Filed
January 19, 2006
Patent Primary Examiner
Patent abstract
New positive photoresist compositions are provided that contain a photoactive component and blend of at least two distinct resins: i) a first resin that comprises carbocyclic aryl units with hetero substitution (particularly hydroxy or thio) and ii) a second cross-linked resin. Preferred photoresists of the invention can be imaged at short wavelengths, such as sub-200 nm, particularly 193 nm.
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