Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hung-Wen Su0
Ming-Hsing Tsai0
Date of Patent
October 6, 2009
0Patent Application Number
110721370
Date Filed
March 4, 2005
0Patent Primary Examiner
Patent abstract
Methods and apparatuses for electrochemically depositing a metal layer onto a substrate. An electrochemical deposition apparatus comprises a substrate holder assembly including a substrate chuck and a relatively soft cathode contact ring. The cathode contact ring comprises an inner portion and an outer portion, wherein the inner portion directly contacts the substrate. An anode is disposed in an electrolyte container. A power supply connects the substrate holder assembly and the anode.
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