Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yoshihiro Kobayashi0
Date of Patent
October 6, 2009
0Patent Application Number
112712360
Date Filed
November 10, 2005
0Patent Primary Examiner
Patent abstract
A substrate for pattern formation, which includes a base material, a wettability inhibition part formed in a functional part formation region to be provided with a functional part on the base material, and a wettability inhibition examining part formed in a functional part non formation region without the functional part provided on the bases material is provided. The same constituent materials are used for the wettability inhibition part and the wettability inhibition examining part.
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