Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 6, 2009
Patent Application Number
12053292
Date Filed
March 21, 2008
Patent Citations Received
Patent Primary Examiner
Patent abstract
To a resist composition comprising a polymer which changes its alkali solubility under the action of an acid as a base resin, is added a copolymer comprising recurring units containing a carboxylic acid ammonium salt and recurring units containing at least one fluorine atom as an additive. The composition is suited for immersion lithography.
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