US Patent 7601479 Polymer, resist composition and patterning process
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Patent Inventor Names
Seiichiro Tachibana0
Tomohiro Kobayashi0
Tsunehiro Nishi0
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Patent abstract
A polymer comprising recurring units of formulae (1) to (4) wherein R1, R3, R4 and R7 are hydrogen or methyl, R2 is an acid labile group, R5 and R6 are hydrogen or hydroxyl, and R8 is a lactone structure group and having a Mw of 1,000-50,000 is provided. A resist composition comprising the inventive polymer has a sensitivity to high-energy radiation, improved resolution and etching resistance and lends itself to lithographic micropatterning with electron beams or deep UV.
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US Patent 07601479 Polymer, resist composition and patterning process US Patent 7601479 Polymer, resist composition and patterning process
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Patent Number
07601479
Patent Number
7601479
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Official Website
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US Patent 07601479 Polymer, resist composition and patterning process
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Is a
Patent jurisdiction
Patent number
07601479
Date of patent
October 13, 2009
Patent application number
10936753
Date Filed
September 9, 2004
Patent primary examiner
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