Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Sang-Jung Kim0
Jae-Hyun Kim0
Jae-Woo Lee0
Jung-Youl Lee0
Deog-Bae Kim0
Geun-Jong Yu0
Date of Patent
October 20, 2009
0Patent Application Number
118526640
Date Filed
September 10, 2007
0Patent Primary Examiner
Patent abstract
The photoresist monomer including an oxime group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
