Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 20, 2009
Patent Application Number
11572894
Date Filed
July 28, 2005
Patent Citations Received
Patent Primary Examiner
Patent abstract
An electrode-less discharge source of extreme ultraviolet (EUV) radiation (10) efficiently assembles a hot, dense, uniform, axially stable plasma column (5) with magnetic pressure and inductive current drive. It employs theta-pinch-type magnetic compression of plasma confined in a magnetic mirror. Plasma, confined in a magnetic mirror, is made to radiate by resonant magnetic compression. The device comprises a radiation-source gas input nozzle (1), an optional buffer-gas input flow (2), mirror-field coils (9a, 9b), theta-pinch coils (8a, 8b), a plasma and debris dump (11), and an evacuation port (7). The circular currents yield an axially stable plasma-magnetic-field geometry, and a reproducible, stable, highly symmetrical EUV source.
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