US Patent 7615259 Method and apparatus for processing workpiece

Patent 7615259 was granted and assigned to Tokyo Electron on November, 2009 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Current Assignee

Tokyo Electron

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

76152590

Patent Inventor Names

Hiroshi Nishikawa0

Date of Patent

November 10, 2009

Patent Application Number

106410560

Date Filed

August 15, 2003

Patent Primary Examiner

‌

Marianne L Padgett

Patent abstract

The present invention is a processing method for applying predetermined processing to a workpiece with said workpiece mounted on a mounting stage arranged in a process chamber in a depressurized atmosphere, in which when no workpiece is mounted on the mounting stage, an inactive gas is discharged from at least a heat transfer gas supply hole of the mounting stage in the process chamber so that a gas layer is formed on a mounting surface of the mounting stage. The present invention is also a processing apparatus.

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