Patent 7615650 was granted and assigned to Mitsubishi Gas Chemical Company on November, 2009 by the United States Patent and Trademark Office.
The invention provides a process for producing a chroman compound represented by formula (1), characterized in that the process includes allowing a phenol, an unsaturated compound, and a formaldehyde to react in the absence of catalyst and in the presence of water in an amount by mole 1 to 10 times that of the phenol.