Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
November 17, 2009
Patent Application Number
10558032
Date Filed
May 20, 2004
Patent Primary Examiner
Patent abstract
A method of applying a pattern on a topography includes first applying a polymer film to an elastomer member, such as PDMS, to form a pad. The pad is then applied to a substrate having a varying topography under pressure. The polymer film is transferred to the substrate due to the plastic deformation of the polymer film under pressure compared to the elastic deformation of the PDMS member. Thus, upon removal of the pad from the substrate, the PDMS member pulls away from the polymer layer, thereby depositing the polymer layer upon the substrate.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.