Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Tsugio Kaneda0
Daisuke Manba0
Osamu Watanabe0
Takanobu Takeda0
Date of Patent
November 17, 2009
0Patent Application Number
115568300
Date Filed
November 6, 2006
0Patent Primary Examiner
Patent abstract
A hydroxystyrene/indene/alkoxyisobutoxystyrene copolymer having Mw of 1,000-500,000 is formulated as a base resin to give a resist composition, typically chemically amplified positive resist composition. The composition exhibits a high resolution, a satisfactory resist pattern profile after development, and improved etch resistance and is thus suitable as a micropatterning material for the fabrication of VLSI.
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