US Patent 7618769 Textured chamber surface
Patent 7618769 was granted and assigned to Applied Materials on November, 2009 by the United States Patent and Trademark Office.
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A method of fabricating a process chamber component having a textured surface includes applying a resist layer on an underlying surface of the component. A predetermined pattern of apertures is formed in the resist layer that exposes the underlying surface of the component. The underlying surface is etched through the apertures in the resist layer to form a textured surface having raised features with top corners. The resist layer is removed, and a treatment step is performed to form top corners that are rounded. In another method, the textured surface is formed by providing a patterned mask having apertures above the surface of the component. A material is sprayed through the apertures in the patterned mask and onto the surface to form a textured surface with raised features having the material.
US Patent 07618769 Textured chamber surface US Patent 7618769 Textured chamber surface
US Patent 07618769 Textured chamber surface
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