Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Akihiro Nakauchi0
Date of Patent
November 17, 2009
Patent Application Number
11067112
Date Filed
February 25, 2005
Patent Primary Examiner
Patent abstract
An exposure apparatus for exposing a pattern of a mask onto an object using light from a light source, includes a projection optical system for projecting the pattern onto the object, and a measuring apparatus for measuring, as an interference fringe, optical performance of the projection optical system using the light, wherein the measuring apparatus is a point diffraction interferometer that has a pinhole to form an ideal spherical wave, a line diffraction interferometer that has a slit to form an ideal cylindrical wave or an ideal elliptical wave, or a shearing interferometer that utilizes a shearing interferometry.
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