US Patent 7622387 Gate electrode silicidation process
Patent 7622387 was granted and assigned to Freescale Semiconductor on November, 2009 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
August 29, 2005
0
Date of Patent
November 24, 2009
0
Patent Application Number
12065256
0
Patent Inventor Names
Vidya Kaushik
0
Benoit Froment
0
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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