Is a
Patent attributes
Current Assignee
0
Patent Jurisdiction
Patent Number
Date of Patent
December 15, 2009
0Patent Application Number
113082450
Date Filed
March 14, 2006
0Patent Primary Examiner
Patent abstract
To avoid the yield of wafers that undergo immersion lithography influencing by delay of post exposure baking (PEB), an operation system adjusts a speed of inputting the wafers to undergo immersion lithography according to a status of wafers that have finished exposure and are waiting for baking. Therefore, the wafers that have finished exposure are transmitted to be baked efficiently and on time.
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