US Patent 7635552 Photoresist composition with antibacterial agent

Patent 7635552 was granted and assigned to Endicott Interconnect Technologies, Inc. on December, 2009 by the United States Patent and Trademark Office.

Overview Structured Data Issues Contributors Activity

Is a

Patent

Patent attributes

Current Assignee

‌

Endicott Interconnect Technologies, Inc.

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

76355520

Patent Inventor Names

Roy H. Magnuson0

John J. Konrad0

Robert A. Sinicki0

Ross W. Keesler0

Date of Patent

December 22, 2009

Patent Application Number

114920290

Date Filed

July 25, 2006

Patent Primary Examiner

‌

Amanda C. Walke

Patent abstract

A photoresist composition, e.g., a positive acting resist, for use in the formation of circuit patterns and the like on printed circuit boards and the like circuitized substrates, the photoresist composition including a quantity of silver therein in a sufficient amount to substantially prevent bacteria formation within said composition. A method of making the composition is also provided.

Timeline

No Timeline data yet.

Further Resources

Title

Author

Link

Type

Date

No Further Resources data yet.

References

Find more entities like US Patent 7635552 Photoresist composition with antibacterial agent

Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.

Open Query Tool

Access by API