Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Wen-Long Lee0
Chyi-Tsong Ni0
Jun Wu0
Shih-Chi Lin0
Date of Patent
December 22, 2009
0Patent Application Number
112086120
Date Filed
August 23, 2005
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A method of smoothening a dielectric layer. First, a substrate is provided. Next, a dielectric layer is formed on the semiconductor substrate. Finally, the dielectric layer is smoothened by a plasma treatment employing a silane based gas and a nitrogen based gas.
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