Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
December 22, 2009
Patent Application Number
11673825
Date Filed
February 12, 2007
Patent Primary Examiner
Patent abstract
The present invention relates to a novel etching solution suitable for characterizing defects on semiconductor surfaces, including silicon germanium surfaces, as well as a method for treating semiconductor surfaces with an etching solution as disclosed herein. This novel etching solution is chromium-free and enables a highly sufficient etch rate and highly satisfactory etch results.
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