US Patent 7636165 Displacement measurement systems lithographic apparatus and device manufacturing method
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Patent abstract
A displacement measurement system configured to provide measurement of the relative displacement of two components in six degrees of freedom with improved consistency and without requiring excessive space.
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US Patent 07636165 Displacement measurement systems lithographic apparatus and device manufacturing method US Patent 7636165 Displacement measurement systems lithographic apparatus and device manufacturing method
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Patent Number
0763616500
Patent Number
763616500
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Patent Jurisdiction
Patent Number
076361650
Date of Patent
December 22, 2009
0Patent Application Number
113848340
Date Filed
March 21, 2006
0Official Website
Patent Primary Examiner
Edits on 24 Sep, 2022
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Infobox
Is a
Patent Jurisdiction
Patent Number
076361650
Date of Patent
December 22, 2009
0Patent Application Number
113848340
Date Filed
March 21, 2006
0Official Website
Patent Primary Examiner
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US Patent 07636165 Displacement measurement systems lithographic apparatus and device manufacturing method
Infobox
Is a
Patent jurisdiction
Patent number
07636165
Date of patent
December 22, 2009
Patent application number
11384834
Date Filed
March 21, 2006
Patent primary examiner
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