Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ryotaro Hayashi0
Date of Patent
December 29, 2009
0Patent Application Number
115766870
Date Filed
October 4, 2005
0Patent Primary Examiner
Patent abstract
A positive resist composition that includes a resin component (A) and an acid generator component (B), wherein the component (A) includes a polymer compound (A1) having a structural unit (a0) represented by a general formula (a0) shown below, and a structural unit (a1), which is derived from an (α-lower alkyl) acrylate ester containing an acid-dissociable, dissolution-inhibiting group and is not classified as the structural unit (a0):
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