Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Tsunehiro Nishi0
Akihiro Seki0
Katsuya Takemura0
Shigeo Tanaka0
Date of Patent
December 29, 2009
0Patent Application Number
119873330
Date Filed
November 29, 2007
0Patent Primary Examiner
Patent abstract
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising specific recurring units. When processed by ArF lithography, the composition is improved in resolution and forms a pattern with a minimal line edge roughness.
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