Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Koichi Wago0
Date of Patent
January 5, 2010
0Patent Application Number
119559050
Date Filed
December 13, 2007
0Patent Primary Examiner
Patent abstract
A rotary apertured interferometric lithography (RAIL) system that includes interferometric lithography tools, a mask with a slit preferably with an arc shape, and a rotating stage is disclosed. The RAIL system could create a servo pattern of a recording-head trajectory of a hard disk drive in a master for magnetic-contact printing. The master can could be used to form arrays of sub-micron sized magnetic elements on a magnetic disk media for high-density magnetic recording applications.
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