US Patent 7643528 Immersion lithography laser light source with pulse stretcher
Patent 7643528 was granted and assigned to Cymer on January, 2010 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
October 10, 2007
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Date of Patent
January 5, 2010
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Patent Application Number
11973671
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Patent Inventor Names
William N. Partlo
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Robin Swain
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Vladimir B. Fleurov
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Walter Crosby
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Alexander I. Ershov
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Christian J. Wittak
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Daniel J. W. Brown
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Ed Danielewicz
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Edward Arriola
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German Rylov
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Patent Jurisdiction
Patent Number
Patent Primary Examiner
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