Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jun Seok Lee0
Date of Patent
January 12, 2010
Patent Application Number
11779968
Date Filed
July 19, 2007
Patent Primary Examiner
Patent abstract
In a fabrication method of a semiconductor device a manufacturing method of a mask and an optimization method of a mask bias incorporating an optical proximity correction are provided. The manufacturing method of the mask incorporating an optical proximity correction can form a pattern in an excellent quality in a dense area where a micro design pattern in an irregular array state is formed. Also, a desired design pattern can be formed using a mask according to embodiments of the present invention regardless of an array state.
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