Patent 7647825 was granted and assigned to Hitachi on January, 2010 by the United States Patent and Trademark Office.
In the thermal type flowmeter for measuring the flow rate by a measuring element with an exothermic resistor and a temperature measuring resistor being shaped in the side of the surface of a substrate, a facing wall facing the surface of the measuring element is arranged, cantilever plate parts protruding from the facing wall toward the measuring element side are arranged, a gap is provided between the tip of the cantilever plate parts and the measuring element, and the cantilever plate parts are extended from the upper stream to the down stream of the measuring element.