US Patent 7648229 Liquid jet head and its manufacturing method
Patent 7648229 was granted and assigned to Seiko Epson on January, 2010 by the United States Patent and Trademark Office.
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Patent abstract
A liquid jet head includes: a substrate; a pressure generation chamber provided in the substrate; an elastic plate provided above the substrate; a capacitor structure section provided above the elastic plate, the capacitor structure section including a lower electrode layer, a piezoelectric layer and an upper electrode layer; a porous layer provided above the capacitor structure section; a seal layer provided on the porous layer; and a void section formed between the capacitor structure section and the porous layer.
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Patent Inventor Names
Hiromu Miyazawa0
Masao Nakayama0
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Official Website
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US Patent 07648229 Liquid jet head and its manufacturing method US Patent 7648229 Liquid jet head and its manufacturing method
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Patent Number
07648229
Patent Number
7648229
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US Patent 07648229 Liquid jet head and its manufacturing method
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Is a
Current assignee
Patent jurisdiction
Patent number
07648229
Date of patent
January 19, 2010
Patent application number
11831178
Date Filed
July 31, 2007
Patent primary examiner
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