Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
January 19, 2010
Patent Application Number
11688565
Date Filed
March 20, 2007
Patent Citations Received
Patent Primary Examiner
Patent abstract
Improving the resistance of members and parts disposed inside of vessels such as semiconductor processing devices for conducting plasma etching treatment in a strong corrosive environment. A ceramic coating member for a semiconductor processing apparatus comprises a porous layer made of an oxide of an element in Group IIIb of the Periodic Table coated directed or through an undercoat on the surface of the substrate of a metal or non-metal and a secondary recrystallized layer of the oxide formed on the porous layer through an irradiation treatment of a high energy such as electron beam and laser beam.
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