Patent attributes
A processing method uses a processing system which includes an atmosphere replacing chamber having first and second gate valves, and a container that has an inside maintained in a reduced pressure or vacuum atmosphere and provides a predetermined process to an object, wherein the atmosphere replacing chamber is connected to the container through the first gate valve and a space different from the container through the second gate valve. The processing method includes the steps of exhausting the atmosphere replacing chamber while introducing first gas below predetermined humidity to the atmosphere replacing chamber, and vacuum-pumping the atmosphere replacing chamber after said exhausting step, by reducing an amount of the first gas to be introduced into the atmosphere replacing chamber.
