US Patent 7651824 Method for compensating critical dimension variations in photomasks

Patent 7651824 was granted and assigned to Nanya Technology Corporation on January, 2010 by the United States Patent and Trademark Office.

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Patent

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Current Assignee

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

7651824

Patent Inventor Names

Chih-Cheng Chin0

Hsuan-Ko Chen0

Mei-Li Wang0

Pei-Cheng Fan0

Date of Patent

January 26, 2010

Patent Application Number

12329628

Date Filed

December 7, 2008

Patent Primary Examiner

‌

Christopher G Young

Patent abstract

A method for compensating critical dimension (CD) variations of patterns of a substrate, by the correcting the CD of the corresponding photomask is disclosed. First, a light and a main photomask are provided. Second, an auxiliary photomask including an auxiliary transparent substrate and a shading element within the auxiliary transparent substrate is provided. Next the light passes through the auxiliary photomask and main photomask in order for compensating CD variations of patterns corresponding to main photomask.

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