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US Patent 7652901 High frequency excitation system

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
July 15, 2008
Date of Patent
January 26, 2010
Patent Application Number
12173339
Patent Citations Received
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US Patent 12125673 Pulsed voltage source for plasma processing applications
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US Patent 12064591 Infusion pump system and method
0
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US Patent 12076160 Alarms and alerts for medication delivery devices and systems
0
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US Patent 12106837 Occlusion resolution in medication delivery devices, systems, and methods
0
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US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
0
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US Patent 12111341 In-situ electric field detection method and apparatus
0
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US Patent 11776788 Pulsed voltage boost for substrate processing
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US Patent 11776789 Plasma processing assembly using pulsed-voltage and radio-frequency power
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US Patent 11791138 Automatic electrostatic chuck bias compensation during plasma processing
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US Patent 11857763 Adjusting insulin delivery rates
0
•••
Patent Inventor Names
Thomas Kirchmeier
0
Wolfgang R. Oestreicher
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7652901
Patent Primary Examiner
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Matthew V. Nguyen

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