Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Kazuya Nagaseki0
Tsuyoshi Moriya0
Date of Patent
February 2, 2010
Patent Application Number
11671821
Date Filed
February 6, 2007
Patent Citations Received
0
Patent Primary Examiner
Patent abstract
A substrate processing method for a substrate processing system comprising at least a substrate processing apparatus that subjects a substrate to processing, and a substrate transferring apparatus having a transferring device that transfers the substrate, which enables the yield to be increased without bringing about a decrease in the throughput. The substrate processing method comprises a jetting step of jetting a high-temperature gas onto at least one of the transferring device and the substrate transferred by the transferring device.
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