US Patent 7655385 Pattern formation method
Patent 7655385 was granted and assigned to Panasonic on February, 2010 by the United States Patent and Trademark Office.
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Patent abstract
After forming a resist film including a hygroscopic compound, pattern exposure is performed by selectively irradiating the resist film with exposing light while supplying water onto the resist film. After the pattern exposure, the resist film is developed so as to form a resist pattern.
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US Patent 07655385 Pattern formation method US Patent 7655385 Pattern formation method
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Patent Number
0765538500
Patent Number
765538500
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
076553850
Date of Patent
February 2, 2010
0Patent Application Number
117230560
Date Filed
March 16, 2007
0Official Website
Patent Primary Examiner
Edits on 25 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
076553850
Date of Patent
February 2, 2010
0Patent Application Number
117230560
Date Filed
March 16, 2007
0Official Website
Patent Primary Examiner
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US Patent 07655385 Pattern formation method
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07655385
Date of patent
February 2, 2010
Patent application number
11723056
Date Filed
March 16, 2007
Patent primary examiner
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