US Patent 7666796 Substrate patterning for multi-gate transistors

Patent 7666796 was granted and assigned to Intel on February, 2010 by the United States Patent and Trademark Office.

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Date of Patent

February 23, 2010

Patent Application Number

11388526

Date Filed

March 23, 2006

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Patent abstract

Some embodiments of the present invention include apparatuses and methods relating to improved substrate patterning for multi-gate transistors.

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