Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
March 2, 2010
Patent Application Number
11998227
Date Filed
November 29, 2007
Patent Citations Received
Patent Primary Examiner
Patent abstract
An asymmetric bis-silane compound of the formulaA3Si—R1—SiB3 where A, B, and R1 are as defined herein, and to methods for making the bis-silane compound and their use to form layers or films of metal oxide particles, and which layers or films adhere to a suitable substrate. The materials and methods can be used, for example, to make photoactive devices.
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