US Patent 7678705 Plasma semiconductor processing system and method
Patent 7678705 was granted and assigned to Tegal Corporation on March, 2010 by the United States Patent and Trademark Office.
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Patent abstract
An apparatus to perform semiconductor processing includes a process chamber; a plasma generator for generating a plasma in the process chamber; and a helical ribbon electrode coupled to the output of the plasma generator.
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US Patent 07678705 Plasma semiconductor processing system and method US Patent 7678705 Plasma semiconductor processing system and method
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Patent Number
0767870500
Patent Number
767870500
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
076787050
Date of Patent
March 16, 2010
0Patent Application Number
098984390
Date Filed
July 5, 2001
0Official Website
Patent Primary Examiner
Edits on 23 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
076787050
Date of Patent
March 16, 2010
0Patent Application Number
098984390
Date Filed
July 5, 2001
0Official Website
Patent Primary Examiner
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US Patent 07678705 Plasma semiconductor processing system and method
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07678705
Date of patent
March 16, 2010
Patent application number
09898439
Date Filed
July 5, 2001
Patent primary examiner
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