US Patent 7684038 Overlay metrology target
Patent 7684038 was granted and assigned to KLA-Tencor on March, 2010 by the United States Patent and Trademark Office.
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Patent abstract
In one embodiment, a metrology target for determining a relative shift between two or more successive layers of a substrate may comprise; an first structure on a first layer of a substrate and an second structure on a successive layer to the first layer of the substrate arranged to determine relative shifts in alignment in both the x and y directions of the substrate by analyzing the first structure and second structure overlay.
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US Patent 07684038 Overlay metrology target US Patent 7684038 Overlay metrology target
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Patent Number
0768403800
Patent Number
768403800
Edits on 18 May, 2023
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Official Website
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
076840380
Date of Patent
March 23, 2010
0Patent Application Number
120628740
Date Filed
April 4, 2008
0Official Website
Patent Primary Examiner
Edits on 27 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
076840380
Date of Patent
March 23, 2010
0Patent Application Number
120628740
Date Filed
April 4, 2008
0Official Website
Patent Primary Examiner
Edits on 18 Jun, 2022
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US Patent 07684038 Overlay metrology target
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07684038
Date of patent
March 23, 2010
Patent application number
12062874
Date Filed
April 4, 2008
Patent primary examiner
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