Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Shin-Rung Lu0
Shui-Tien Lin0
Yi-Chuan Lo0
Date of Patent
March 30, 2010
0Patent Application Number
111931260
Date Filed
July 29, 2005
0Patent Primary Examiner
Patent abstract
A method for photolithography in semiconductor device manufacturing comprises defining test critical dimension target for a photolithography mask, measuring a mask critical dimension, comparing mask critical dimension to the test critical dimension target and determining a critical dimension deviation, determining a photolithography light base energy in response to the critical dimension deviation, and exposing the wafer according to the photolithography light base energy.
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