US Patent 7687446 Method of removing residue left after plasma process
Patent 7687446 was granted and assigned to United Microelectronics Corporation on March, 2010 by the United States Patent and Trademark Office.
Is a
Date Filed
February 6, 2006
Date of Patent
March 30, 2010
Patent Application Number
11307394
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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