Patent 7687846 was granted and assigned to SAMSUNG ELECTRONICS CO., LTD. on March, 2010 by the United States Patent and Trademark Office.
Disclosed are nonvolatile memory devices and methods of fabricating the same. A nonvolatile memory device can include a field isolation film configured to define active regions in a substrate and a wordline configured to intersect the active regions. Devices can also include source and drain regions formed in each of the active regions at both sides of the wordline and a source line configured to extend along the wordline under the source region. Devices can further include a join region configured to connect the source region with the source line.