US Patent 7691210 Resist film removing method
Patent 7691210 was granted and assigned to Tokyo Electron on April, 2010 by the United States Patent and Trademark Office.
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Patent abstract
A resist film removing method for removing a resist film disposed on a substrate and having a cured layer at a surface includes covering the surface of the resist film with a protection film; causing popping in the resist film covered with the protection film; denaturing the resist film and the protection film after causing popping, to be soluble in water; and performing purified water cleaning to remove from the substrate the resist film and the protection film denatured to be soluble in water.
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US Patent 07691210 Resist film removing method US Patent 7691210 Resist film removing method
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Patent Number
0769121000
Patent Number
769121000
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Official Website
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
076912100
Date of Patent
April 6, 2010
0Patent Application Number
115438190
Date Filed
October 6, 2006
0Official Website
Patent Primary Examiner
Edits on 22 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
076912100
Date of Patent
April 6, 2010
0Patent Application Number
115438190
Date Filed
October 6, 2006
0Official Website
Patent Primary Examiner
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US Patent 07691210 Resist film removing method
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07691210
Date of patent
April 6, 2010
Patent application number
11543819
Date Filed
October 6, 2006
Patent primary examiner
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