Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Seong-yoon Kim0
Date of Patent
April 6, 2010
0Patent Application Number
122229870
Date Filed
August 21, 2008
0Patent Primary Examiner
Patent abstract
There is provided a method of manufacturing a photomask for forming a semiconductor pattern. The method may include forming a plurality of dies including a main pattern, and forming a pseudo pattern to an area adjacent to the main pattern between the plurality of dies. A multi developing process of sequentially and repeatedly supplying a developer on the mask, supplying DI water on the mask, and drying the mask may be performed in manufacturing the mask.
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