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Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Fredericus Johannes Touwslager0
Date of Patent
April 13, 2010
0Patent Application Number
105032480
Date Filed
February 5, 2003
0Patent Primary Examiner
Patent abstract
The invention pertains to a photo-sensitive composition which comprises a photochemical initiator, a polyacid or a salt thereof, and a poly(3,4-alkylenedioxythiophene) wherein the alkylene moiety is —(CH2)n-, n being an integer from 1 to 3, or 1,2-cyclo-hexylene, which may optionally be substituted, characterized in that the photochemical initiator is a water-soluble polymer comprising at least two azide or diazonium groups. Preferably, the water-soluble polymer is chemically stable at pH 6 or less, more preferably at pH 2 or less.
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