Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Toshiaki Fujii0
Date of Patent
April 20, 2010
0Patent Application Number
105635150
Date Filed
July 5, 2004
0Patent Citations Received
Patent Primary Examiner
Patent abstract
In a method of making a lamina specimen, first and second ion beams are simultaneously used to sputter etch first and second side walls of a lamina region at the same time under first and second ion beam conditions. A scanning ion microscope observation of the lamina region is made using the second ion beam while sputter etching of the first and second side walls is continued using the first ion beam until the thickness of the lamina has a predetermined value.
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