US Patent 7704681 Manufacturing method for pixel structure

A manufacturing method for a pixel structure is provided. The method includes the following steps. A first photomask is used to form a source/drain on a substrate. A second photomask is used twice to form a transparent conductive layer and a channel layer on the substrate respectively. The transparent conductive layer covers a portion of the source/drain and is electrically connected with the same, and the pattern of the transparent conductive layer and the pattern of the channel layer are complementary patterns. Then, a dielectric layer is formed over the substrate to cover the transparent conductive layer and the channel layer. A third photomask is used to form a gate on the dielectric layer.