Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yasutomo Kawanishi0
Kenji Wada0
Sou Kamimura0
Date of Patent
May 18, 2010
Patent Application Number
11864049
Date Filed
September 28, 2007
Patent Primary Examiner
Patent abstract
A resist composition, includes: (B) a polymer having a group capable of decomposing under an action of an acid and having a weight average molecular weight of 1,000 to 5,000, of which solubility in an alkali developer increases under an action of an acid; and (Z) a compound containing a sulfonium cation having a structure represented by formula (Z-1):
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