Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
May 18, 2010
Patent Application Number
11865290
Date Filed
October 1, 2007
Patent Primary Examiner
Patent abstract
The present invention relates to a hybrid planar lightwave circuit in which a silicon reflective diffraction grating etched with a highly accurate deep reactive ion etching process is mounted in a trench formed in a high optical performance silica on silicon waveguide device.
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