Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Tsai-Cheng Gau0
Fu-Jye Liang0
Hsiao-Tzu Lu0
Kuei Shun Chen0
Chin-Hsiang Lin0
Chun-Kung Chen0
Date of Patent
May 25, 2010
0Patent Application Number
112595890
Date Filed
October 26, 2005
0Patent Primary Examiner
Patent abstract
A method for photolithography in semiconductor manufacturing includes providing a substrate for a wafer and providing a mask for exposing the wafer. The wafer is exposed by utilizing a combination of high angle illumination and focus drift exposure methods.
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