Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Binod B. De0
Chisun Hong0
Raj Sakamuri0
Sanjay Malik0
Date of Patent
June 1, 2010
0Patent Application Number
120339150
Date Filed
February 20, 2008
0Patent Primary Examiner
Patent abstract
An etch resistant thermally curable Underlayer for use in a multiplayer liyhographic process to produce a photolithographic bilayer coated substrate, the composition having:(a) at least one cycloolefin polymer comprising at least one repeating unit of Structure (I), and at least one repeating unit of Structure (II), and optionally at least one repeating unit of Structure (III) with the proviso that neither Structure (I) nor Structure (II) nor Structure (III) contains acid sensitive groups.
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